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    合肥单晶材料科技有限公司

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      Boron Nitride Film on Silicon Wafer, 24 nm / 4" -- BN-Si-100-24nm - FmBNonSia100D0525C1FT24nm

      Boron-Nitride on Silicon

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      $ 800.4

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      Category：

      Thin Films

      A-D

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      Boron Nitride Film on Silicon Wafer, 24 nm / 4" -- BN-Si-100-24nm - FmBNonSia100D0525C1FT24nm

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      • Description

      • 　　Boron Nitride Film

        　　Boron nitride is a chemical compound with the chemical formula BN, consisting of equal numbers of boron and nitrogen atoms. BN film is amorphous t Its hardness is inferior only to diamond, but its thermal and chemical stability is superior. Low-pressure deposition of thin films of boron nitride is grown on Si (100) wafers for this product by sputtering

        　　BN Film coated by sputtering method

        　　The amorphous structure ( no orientation)

        　　Dielectric

        　　BN Thickness: 24 nm +/- 10%

        　　Purity: > 99.99%

        　　Silicon Wafer Specifications:

        　　Conductive type: Si n-type

        　　Resistivity: 0.1-1.0 ohm-cm

        　　Size: 4" diameter +/- 0.5 mm x 0.525 +/- 0.025 mm ( thickness)

        　　Orientation: (100) +/- 0.5o

        　　Polish: One sides polished

        　　Surface roughness: Prime

        　　Packing: Vacuum packed on a 4" single wafer carrier box

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      Company Name: Hefei Monocrystalline Material Technology Co., Ltd
      Address: Room 401, Building 1, Comprehensive Building, Shanhu Road, Shushan District, Hefei City, Anhui Province
      Bank of Deposit: Bank of Communications Co., Ltd. Hefei Huayuan Street Branch

      Account: 3413 2100 0013 0015 27315

      Tax ID: 9134 0104 MA8N LK2Q 7J

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