Features:
- Sapphire (single crystal of Al2O3 ) is being used extensively as a substrate for III-V nitrides and for many other epitaxial films
- Orientation: C-axis[0001]( +/-0.3 Deg) with Standard Flat
- Diameter: 2" +/- 0.3mm
- Thickness: 500um +/- 25 um
- Major Flat: A-axis[11-20]+/-0.2o
- Surface Finish: Front sides: Epi- polished Ra<0.5nm (by AFM)
- Back side: Epi- polished , <0.5nm(by AFM)
- TTV: < 10um
- Polished surface: Two side epi polished by special CMP technology
- Package: Each wafer is packed in 1000 class clean room
Typical Properties:
- Crystal Structure: Hexagonal. a=4.758 Angstroms c=12.99 Angstroms
- Melting Point: 2040 degree C
- Density: 3.97 gram/cm2
- Growth Technique: CZ
- Crystal Purity: >99.99%
- Hardness: 9 ( mohs)
- Thermal Expansion: 7.5x10-6 (/ oC)
- Thermal Conductivity: 46.06 @ 0 oC, 25.12 @ 100 oC, 12.56 @ 400 oC ( W/(m.K) )
- Dielectric Constant: ~ 9.4 @300K at A axis ~ 11.58@ 300K at C axis
- Loss Tangent at 10 GHz: < 2x10-5 at A axis, <5 x10-5 at C axis

Aluminum Single Crystal Substrate: <100>, 10x10x1.0 mm, 1 side polished - mcALa101010S1

Al2O3 single crystal substrate , <0001> 4"Dia. x 0.5mm 2sp

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