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    合肥单晶材料科技有限公司

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      4H-SiC Epitaxial Film on 4H-SiC (0001) w/ 8 degree off, P type,2"dia.x0.33mm, carrier conc. 1.4 E17/cc, 2sp, thickness 4.3um-Fm4HSCon4HSC50d03C2deg8US

      SiC-4H film on SiC-4H

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      $ 3448.85

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      Thin Films

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      4H-SiC Epitaxial Film on 4H-SiC (0001) w/ 8 degree off, P type,2"dia.x0.33mm, carrier conc. 1.4 E17/cc, 2sp, thickness 4.3um-Fm4HSCon4HSC50d03C2deg8US

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      • Description

      • 　　Specifications

        　　Film:

        　　4H-SiC (0001)

        　　Film target thickness: 4.3 microns with (thickness acceptation range) +/- 10%

        　　Film target doping layer: 1.4E17/cc with (doping acceptation range) +0% /- 30%

        　　Conductive Type P type with

        　　Surface finish Both sides will be polished after deposition, Both Front and Backside Epiwafer polishing with Ra or RMS < 5 Angstrom

        　　Substrate:

        　　4H-SiC (0001) Prime grade

        　　Off axis: miscut 8.0 +/- 0.5 degree

        　　Prime Grade: with FWHM 20 arc second

        　　OF orientation: parallel {10-10} +/- 5 degree

        　　OF length: 15.9 +/- 1.7 mm

        　　IF orientation: 90 degree cw. from OF +/- 5 degree

        　　IF length: 8.0 +/- 1.7 mm

        　　Diameter: 50.8 +/- 0.38 mm

        　　Thickness: 330 +/- 25 um

        　　Resistivity: < 0.03 ohm-cm

        　　Edge exclusion: 1mm

        　　Two sides polished with Si-face CMP with average roughness: Ra < 0.2 RMS

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      Manager Xu：86-13855129449

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      E-mail：saleswafer@126.com

      No. 558 Shanhu Road, Shushan District, Hefei City, Anhui Province

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      Company Name: Hefei Monocrystalline Material Technology Co., Ltd
      Address: Room 401, Building 1, Comprehensive Building, Shanhu Road, Shushan District, Hefei City, Anhui Province
      Bank of Deposit: Bank of Communications Co., Ltd. Hefei Huayuan Street Branch

      Account: 3413 2100 0013 0015 27315

      Tax ID: 9134 0104 MA8N LK2Q 7J

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