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    合肥单晶材料科技有限公司

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      Silicon Nitride Film (LPCVD) on Corning 7980, Film thickness: 1.3um

      Silicon-Nitride on Corning 7980

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      $ 688.85

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      Thin Films

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      Silicon Nitride Film (LPCVD) on Corning 7980, Film thickness: 1.3um

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      • Description

      • 　　Silicon Nitride Film

        　　Si3N4 Film-coated by low-stress LPCVD method

        　　Si3N4 Thickness: 1.3um +/- 5%

        　　Si3N4 covers both sides on Corning 7980 0F fused silica ( Warning: the Si3N4 film may have stressed induced microcracking resulted from the large difference of thermal expansion coefficient between Si3N4 and SiO2 fused silica )

        　　Nitride Thickness: 13000 Angstroms +/-5%

        　　Nitride Ref Index : 2.30 +/-0.05

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      100 nm Silicon Nitride Film (PE-CVD) on Si(100)P-type ,B-doped 100 mm dia .x0.525mm thick, 1sp,R:0.001-0.005 ohm.cm - FmSi3N4onSiBa100D0525C1FT100

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      Company Name: Hefei Monocrystalline Material Technology Co., Ltd
      Address: Room 401, Building 1, Comprehensive Building, Shanhu Road, Shushan District, Hefei City, Anhui Province
      Bank of Deposit: Bank of Communications Co., Ltd. Hefei Huayuan Street Branch

      Account: 3413 2100 0013 0015 27315

      Tax ID: 9134 0104 MA8N LK2Q 7J

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